Electron induced collision and ionization of technologically relevant atoms/molecules-a theoretical study
dc.contributor.author | Goswami, Biplab | |
dc.date.accessioned | 2017-11-15T14:18:17Z | |
dc.date.available | 2017-11-15T14:18:17Z | |
dc.date.issued | 2014-08 | |
dc.identifier.uri | http://hdl.handle.net/123456789/636 | |
dc.language.iso | en | en_US |
dc.publisher | Indian Institute of Technology (Indian School of Mines), Dhanbad | en_US |
dc.subject | Fusion plasmas | en_US |
dc.subject | Lasers | en_US |
dc.subject | Microelectronics fabrications | en_US |
dc.subject | Target model | en_US |
dc.subject | Electron beam lithography | en_US |
dc.subject | APH | en_US |
dc.subject | Ph.D | en_US |
dc.title | Electron induced collision and ionization of technologically relevant atoms/molecules-a theoretical study | en_US |
dc.type | Thesis | en_US |