Temperature dependent dielectric studies of Ni/n-GaP Schottky diodes by capacitance and conductance measurements
| dc.contributor.author | Shiwakoti, N...[ et al.] | |
| dc.date.accessioned | 2018-06-22T09:59:14Z | |
| dc.date.available | 2018-06-22T09:59:14Z | |
| dc.date.issued | 2016 | |
| dc.identifier.citation | Materials Science in Semiconductor Processing,2016,V.42,P.378–382 | en_US |
| dc.identifier.other | http://dx.doi.org/10.1016/j.mssp.2015.11.010 | |
| dc.identifier.uri | http://hdl.handle.net/123456789/1326 | |
| dc.language.iso | en | en_US |
| dc.publisher | Elsevier | en_US |
| dc.subject | Ni/GaP Schottky contacts | en_US |
| dc.subject | Capacitance–voltage | en_US |
| dc.subject | Conductance–voltage | en_US |
| dc.subject | Dielectric properties | en_US |
| dc.subject | Metal–semiconductor interface | en_US |
| dc.subject | SCIE | en_US |
| dc.title | Temperature dependent dielectric studies of Ni/n-GaP Schottky diodes by capacitance and conductance measurements | en_US |
| dc.type | Article | en_US |